Cookies Policy

This site uses cookies. By continuing to browse the site you are agreeing to our use of cookies.

I accept this policy

Find out more here

Oxygen dependence of NO adsorption on Hollandite-type KxGaxSn8–xO16 thin film

No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.

Brill’s MyBook program is exclusively available on BrillOnline Books and Journals. Students and scholars affiliated with an institution that has purchased a Brill E-Book on the BrillOnline platform automatically have access to the MyBook option for the title(s) acquired by the Library. Brill MyBook is a print-on-demand paperback copy which is sold at a favorably uniform low price.

This Article is currently unavailable for purchase.
Add to Favorites
You must be logged in to use this functionality

Cover image Placeholder

Thin films of hollandite-type K1.9Ga1.9Sn6.1O16 (KGSO) were prepared by a spin-coating method. The films were colorless and transparent, 100-150 nm thick, and consisted of KGSO fine particles of about 20 nm in average size. The adsorption behavior of NO on the KGSO surface was examined by diffuse reflectance infrared fourier transform (DRIFTS). The KGSO was preheated at 968 K in a gas mixture of N2 and O2 prior to NO adsorption. As the oxygen ratio in the gas mixture increased up to 40%, absorption bands emerged and became stronger around 1400 cm-1. Those bands were assigned to NO2 species in chelating and nitrito form. It was found that the coexistence of oxygen remarkably improves the adsorption ability of NO on KGSO surface.


Full text loading...


Data & Media loading...

Article metrics loading...



Can't access your account?
  • Key

  • Full access
  • Open Access
  • Partial/No accessInformation