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Epr Studies On H-Abstraction From Silicon By "Magic Blue" - the F, Si - Nitroxides

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The H-abstraction from benzyl silicanes (3-6), alkoxy silicanes (7-18), phenyl alkoxy silicanes (19-22), and polybenzylsiloxane (23) by "magic blue" solution (in F113, CCIF2-CCl2F) containing the H-abstracting agent [H(CF2)4]NO* (1) and spin trap H(CF2)4NO (2) was studied by EPR detection of the F, Si-nitroxides (a total of 24 from 21 silicon substrates) generated in the reactions. From the EPR spectra of the nitroxides, we have gained information about the position of H-abstraction, the subsequent radical steps after the H-abstraction, as well as the structures of the transient radical intermediates. This technique may serve as a new method for making multi- and polynitroxides under very mild conditions.

Affiliations: 1: Departments of Chemistry and Solid Electronics' Huazhong University of Science and Technology, Wuhan 430074, China; 2: National Laboratory of Applied Organic Chemistry, Lanzhou University, Lanzhou 730000, China


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